Allwin21 Corp.

Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610. Allwin21 is manufacturing the AccuThermo AW-410, AccuThermo AW-610, AccuThermo AW 810, originally the AG Heatpulse 610. The AccuThermo AW-410, AccuThermo AW-610, AccuThermo AW 810 have innovative software and more advanced temperature control technologies.
Allwin21 Corp also supply professionally on the following refurbished semiconductor equipment.
Rapid Thermal Processing System: Refurbished AG Heatpulse 210 / 410 / 610 / 2101 / 2106 / 2148 / 4100 / 4100S / 4108;
Plasma Asher System: Refurbished Matrix 101 / 102 / 103 / 104 / 105 / 106 / 205; Refurbished Gasonics Aura 1000 / 3010 / L3510 / 2000LL; Refurbished Branson IPC 2000 / 3000 / L3100 / L3200;
Plasma Etching System: Refurbished Matrix 303 / 403RefurbishedGasonics AE2001;
Allwin21 Corp. was formed in 2000 to provide seminconductor equipment, services and technical support in Semiconductor industry, MESM, Biomedical, Nanotechnology, Solar Cell. Located in Santa Clara, the heart of Silicon Valley, Allwin21 has been providing unique technical support, high quality equipment and fast supplied spare parts worldwide. We have maintained a global presence that has grown and expanded. into the major semiconductor manufacturing areas of the world. We pride ourselves on developing lasting customer and client relationships.
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Rapid thermal processing
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Rapid thermal processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. The wafers must be brought down (temperature) slow enough however, so they do not break due to thermal shock. . Such rapid heating rates are attained by high intensity lamps process. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition.
Rapid thermal anneal (RTA) is a process used in semiconductor device fabrication which consists of heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film-to-film or film-to-wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from ion implantation, move dopants or drive dopants from one film into another or from a film into the wafer substrate. Rapid thermal anneals are performed by equipment that heats a single wafer at a time using lamp based heating that a wafer is brought near. Unlike furnace anneals they are short in duration, processing each wafer in several minutes. Rapid thermal anneal is a subset of processes called Rapid Thermal Process (RTP) .
AG Associates Heatpulse is one of the most famous RTP equipment manufacturers. Many Integrated Chip companies, R& D centers, Institutes all over the world have been using AG Heatpulse Systems.
Allwin21 Corp can provide the following refurbished RTP equipment
AG Heatpulse 210
AG Heatpulse 410
AG Heatpulse 610
AG Heatpulse 2100
AG Heatpulse 4100
AG Heatpulse 4100S
AG Heatpulse 4108

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